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Triangle Business Inc.
A subsidiary of Triangle Business Inc., the Triangle Business brand is an industry leader in the design and printing of brochures, directories, letterheads, booklets, forms and a variety of other marketing collateral.The present invention relates to aqueous strong acid conductor compositions, more specifically, to aqueous phosphorus acid conductor compositions, as well as their uses and methods of making the same.
Hydrochloric acid is generally used in electronics applications to etch various materials from substrates. For instance, to etch silicon or gallium arsenide, silicon dioxide, polycrystalline silicon, or aluminum from a substrate, a layer of silicon or silicon dioxide containing small amounts of phosphorous and boron is first deposited onto the substrate. The phosphate or borate layer is then removed. Following removal of the phosphate or borate layer, the hydrochloric acid, silicon and metal layers are etched, thereby etching the underlying metal or silicon. This process is illustrated in FIG. 1.
Hydrochloric acid is typically used because of its extreme acidity and because it etches silicon or gallium arsenide about 20 times faster than nitric acid. Other possible solvents for etching silicon include nitric acid, hydrofluoric acid, sulfuric acid and other strong acids such as perchloric acid. However, these acids are often dangerous and/or toxic. Hydrofluoric acid and perchloric acid, for example, are flammable. Furthermore, perchloric acid, which has a low flash point and high toxicity, is a by-product of the manufacture of phosphorus acid, which is necessary to make phosphoric acid.
U.S. Pat. Nos. 5,160,917 and 4,604,260 describe etching silicon with aqueous phosphoric acid and chlorosulfonic acid. These processes require the use of complex phosphoric acid mixtures that are difficult to make.
U.S. Pat. Nos. 4,055,578 and 3,976,463 describe etching silicon with hydrogen peroxide solutions. U.S. Pat. No. 4,055,578 describes a solution containing hydrogen peroxide and sulfuric acid. Sulfuric acid is an aggressive and highly corrosive material.
Attempts have been made to use water-soluble tetraalkyl ammonium hydroxide to etch silicon. However, such solutions suffer
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We were lucky enough to rent a wonderful apartment in Old Prague from Ambassadeur Hostel last year. Coming from Tokyo, we were impressed by the well-maintained rooms in our apartment, and the service of the staff. There were other guests staying with us, who were from around Europe, including the U.S. The ambiance of the hostel was really nice, and the neighborhood was quiet. We ate…
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AmbassadeurHostel, Manager at Ambassadeur Hostel, responded to this review
We are really happy that you enjoyed your stay in our hostel. Thank you for your feedback and we are looking forward to welcoming you back to Prague.
Ambassadeur Hostel is a lovely, unique, boutique hostel in Prague’s Old Town. The location is ideal for first-timers, the staff are extremely friendly, and the overall ambiance is warm and welcoming. Our room was great; it had a large double bed, which was situated in a great location near our room, with lots of natural light, and an amazing en suite bathroom. The breakfast was…
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I had the chance of meeting the ambassadeur staff at one of our locations (which is what the name Ambassadeur Hostel means) and I was very impressed by them and by the level of friendliness they showed. Their apartments are safe and are great locations.
My friend and I spent 2 nights at this hostel. We booked the 2-bed room with private bathroom and had an amazing time. The hostel is located in a quiet
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